TiN crystal structure features in cBN—TiN—Al composite sintered at high pressures and temperatures
Keywords:high pressure, superhard materials, titanium nitride, X-ray diffraction, crystal structure
The crystal structure of titanium nitride TiN, which along with cBN and reaction products of the charge components (TiB2 and AlN) exists in composites obtained by HPHT sintering (7. 7 GPa, 1750-2300 °C; charge content: 60 vol. % of cBN, 35 vol. % of TiN, and 5 vol. % of Al) was studied in detail by the X-ray diffraction method. A model of a modified NaCl type structure is proposed for the crystal structure of TiN nitride based on the X-ray diffraction calculations. This model is characterized by the presence of additional nitrogen atoms statistically placed on the vertices of octahedra located around the available vacancies of nitrogen atoms from the main lattice of NaCl type. It is shown that, at the HPHT sintering, TiN nitride acts as a source of additional nitriding of the composite surface, which most effectively acts in the temperature interval 2000-2150 °C, in which the maximum value of microhardness of cBN—TiN—Al composite of 31-32 GPa is obtained.
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